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Low-temperature deposition of weakly-stressed nanocrystalline silicon films by reactive magnetron sputtering

A. Ben Othman, Y. Leconte, P. Marie, K. Zellama, C. Goncalves, X. Portier, M. Daouahi, H. Bouchriha and R. Rizk

Eur. Phys. J. Appl. Phys., 29 1 (2005) 33-38

DOI: https://doi.org/10.1051/epjap:2004207

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