CF4 doping effects on SiOF thin films: chemical, structural and dielectric properties in PECVD-deposited films from HMDSO/O2 vapor mixturesR. Chabane, S. Sahli and P. RaynaudEur. Phys. J. B, 98 5 (2025) 112DOI: https://doi.org/10.1140/epjb/s10051-025-00973-8