Characterization of the ion cathode fall region in relation to the growth rate in plasma sputter depositionA. Palmero, E. D. van Hattum, H. Rudolph and F. H.P.M. HabrakenEur. Phys. J. D, 41 2 (2007) 303-309DOI: https://doi.org/10.1140/epjd/e2006-00218-8