EPJ

Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C₂H₄/N₂ townsend dielectric barrier discharge

C. Sarra-Bournet, N. Gherardi, S. Turgeon, G. Laroche and F. Massines

Eur. Phys. J. Appl. Phys., 47 2 (2009) 22820

Published online: 28 April 2009

DOI: 10.1051/epjap/2009079

C. Sarra-Bournet

N. Gherardi

S. Turgeon

G. Laroche

F. Massines

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