EPJ

Substrate-plasma interaction during amorphous silicon thin films growth by sputtering technique

F. Khelfaoui and M. S. Aida

Eur. Phys. J. Appl. Phys., 47 3 (2009) 31001

Published online: 12 June 2009

DOI: 10.1051/epjap/2009109

F. Khelfaoui

M. S. Aida

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