EPJ

Atomic scale study of InP etching by Cl₂-Ar ICP plasma discharge

A. Rhallabi, R. Chanson, J.-P. Landesman, C. Cardinaud and M.-C. Fernandez

Eur. Phys. J. Appl. Phys., 53 3 (2011) 33606

Published online: 22 February 2011

DOI: 10.1051/epjap/2010100056

A. Rhallabi

R. Chanson

J.-P. Landesman

C. Cardinaud

M.-C. Fernandez

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