EPJ

Control of the substrate temperature using a triode magnetron sputtering system

D. A. Duarte, J. C. Sagás, L. C. Fontana, A. S. da Silva Sobrinho and M. J. Cinelli

Eur. Phys. J. Appl. Phys., 52 3 (2010) 31001

Published online: 30 November 2010

DOI: 10.1051/epjap/2010149

D. A. Duarte

J. C. Sagás

L. C. Fontana

A. S. da Silva Sobrinho

M. J. Cinelli

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