EPJ

Effect of N doping on hole density of Cu₂O:N films prepared by the reactive magnetron sputtering method

B.B. Li, L. Lin, H.L. Shen, F.E. Boafo, Z.F. Chen, B. Liu and R. Zhang

Eur. Phys. J. Appl. Phys., 58 2 (2012) 20303

Published online: 25 May 2012

DOI: 10.1051/epjap/2012120020

B.B. Li

L. Lin

H.L. Shen

F.E. Boafo

Z.F. Chen

B. Liu

R. Zhang

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