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Depth profiling and morphological characterization of AlN thin films deposited on Si substrates using a reactive sputter magnetron

Carlos Macchi, Juan Bürgi, Javier García Molleja, Sebastiano Mariazzi, Mattia Piccoli, Edoardo Bemporad, Jorge Feugeas, Roberto Sennen Brusa and Alberto Somoza

Eur. Phys. J. Appl. Phys., 67 2 (2014) 21301

Published online: 01 August 2014

DOI: 10.1051/epjap/2014140191

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