EPJ

() preferential orientation of polycrystalline AlN grown on SiO₂/Si wafers by reactive sputter magnetron technique

Juan Bürgi, Javier García Molleja, Raúl Bolmaro, Mattia Piccoli, Edoardo Bemporad, Aldo Craievich and Jorge Feugeas

Eur. Phys. J. Appl. Phys., 74 1 (2016) 10301

Published online: 01 April 2016

DOI: 10.1051/epjap/2016150446

Juan Bürgi

Javier García Molleja

Raúl Bolmaro

Mattia Piccoli

Edoardo Bemporad

Aldo Craievich

Jorge Feugeas

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