EPJ

The role of a top oxide layer in cavities formed by MeV He implantation into Si

C. Liu, E. Ntsoenzok, R. Delamare, D. Alquier and G. Regula

Eur. Phys. J. AP, 23 1 (2003) 45-48

Published online: 12 June 2003

DOI: 10.1051/epjap:2003038

C. Liu

E. Ntsoenzok

R. Delamare

D. Alquier

G. Regula

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