EPJ

Titanium carbide film deposition on silicon wafers by pulsed KrF laser ablation of titanium in low-pressure CH₄ and C₂H₂ atmospheres

E. D'Anna, M. Fernández, G. Leggieri, A. Luches, A. Zocco and G. Majni

Eur. Phys. J. Appl. Phys., 28 2 (2004) 159-163

Published online: 25 August 2004

DOI: 10.1051/epjap:2004174

E. D'Anna

M. Fernández

G. Leggieri

A. Luches

A. Zocco

G. Majni

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