EPJ

Etching of low-k materials in high density fluorocarbon plasma

D. Eon, V. Raballand, G. Cartry, M.-C. Peignon-Fernandez and Ch. Cardinaud

Eur. Phys. J. Appl. Phys., 28 3 (2004) 331-337

Published online: 23 November 2004

DOI: 10.1051/epjap:2004195

D. Eon

V. Raballand

G. Cartry

M.-C. Peignon-Fernandez

Ch. Cardinaud

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