EPJ

High-density microwave plasma of SiH₄/H₂ for high rate growth of highly crystallized microcrystalline silicon films

H. Jia, J. K. Saha, N. Ohse and H. Shirai

Eur. Phys. J. Appl. Phys., 33 3 (2006) 153-159

Published online: 22 February 2006

DOI: 10.1051/epjap:2006018

H. Jia

J. K. Saha

N. Ohse

H. Shirai

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