EPJ

Post-annealed silicon nanocrystal formation on substoichiometric SiO_xN_y (x < 2, y < 1) layers deposited in SiH₄-N₂O radiofrequency discharges

M. Bedjaoui, B. Despax, M. Caumont and C. Bonafos

Eur. Phys. J. Appl. Phys., 34 2 (2006) 147-150

Published online: 25 May 2006

DOI: 10.1051/epjap:2006050

M. Bedjaoui

B. Despax

M. Caumont

C. Bonafos

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