EPJ

A combined FEG-SEM and TEM study of silicon nanodot assembly

P. Donnadieu, F. Roussel, V. Cocheteau, B. Caussat, P. Mur and E. Scheid

Eur. Phys. J. Appl. Phys., 44 1 (2008) 11-19

Published online: 30 April 2008

DOI: 10.1051/epjap:2008063

P. Donnadieu

F. Roussel

V. Cocheteau

B. Caussat

P. Mur

E. Scheid

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