EPJ

Strong water repellency effect on SiO₂ films processed at a nanometric scale

S. M.M. Ramos, A. Benyagoub, B. Canut, P. De Dieuleveult and G. Messin

Eur. Phys. J. B, 62 4 (2008) 405-410

Published online: 15 May 2008

DOI: 10.1140/epjb/e2008-00182-1

S. M.M. Ramos

A. Benyagoub

B. Canut

P. De Dieuleveult

G. Messin

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