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CF₄ doping effects on SiOF thin films: chemical, structural and dielectric properties in PECVD-deposited films from HMDSO/O₂ vapor mixtures

R. Chabane, S. Sahli and P. Raynaud

Eur. Phys. J. B, 98 5 (2025) 112

Published online: 31 May 2025

DOI: 10.1140/epjb/s10051-025-00973-8

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