EPJ

Characterization of the ion cathode fall region in relation to the growth rate in plasma sputter deposition

A. Palmero, E. D. van Hattum, H. Rudolph and F. H.P.M. Habraken

Eur. Phys. J. D, 41 2 (2007) 303-309

Published online: 27 September 2006

DOI: 10.1140/epjd/e2006-00218-8

A. Palmero

E. D. van Hattum

H. Rudolph

F. H.P.M. Habraken

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