EPJ

Carbon-free SiO_x films deposited from octamethylcyclotetrasiloxane (OMCTS) by an atmospheric pressure plasma jet (APPJ)

J. Schäfer, R. Foest, A. Quade, A. Ohl, J. Meichsner and K. D. Weltmann

Eur. Phys. J. D, 54 2 (2009) 211-217

Published online: 13 February 2009

DOI: 10.1140/epjd/e2009-00048-2

J. Schäfer

R. Foest

A. Quade

A. Ohl

J. Meichsner

K. D. Weltmann

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