EPJ

Growth and properties of Ti-Cu films with respect to plasma parameters in dual-magnetron sputtering discharges

V. Stranak, H. Wulff, R. Bogdanowicz, S. Drache, Z. Hubicka, M. Cada, M. Tichy and R. Hippler

Eur. Phys. J. D, 64 2-3 (2011) 427-435

Published online: 11 October 2011

DOI: 10.1140/epjd/e2011-20393-7

V. Stranak

H. Wulff

R. Bogdanowicz

S. Drache

Z. Hubicka

M. Cada

M. Tichy

R. Hippler

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