Plasma characterization in reactive sputtering processes of Ti in Ar/O2 mixtures operated in metal, transition and poisoned modes: a comparison between direct current and high-power impulse magnetron discharges
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Eur. Phys. J. D, 71 10 (2017) 245
Published online: 03 October 2017
DOI: 10.1140/epjd/e2017-80106-x