EPJ

Dependence of the contact line roughness exponent on the contact angle on substrates with dilute mesa defects: numerical study

Stanimir Iliev, Nina Pesheva and Pavel Iliev

Eur. Phys. J. E, 45 8 (2022) 66

Published online: 08 August 2022

DOI: 10.1140/epje/s10189-022-00220-3

Stanimir Iliev

Nina Pesheva

Pavel Iliev

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