EPJ

A novel passivation process of silicon nanowires by a low-cost PECVD technique for deposition of hydrogenated silicon nitride using SiH₄ and N₂ as precursor gases

Lamia Bouaziz, Donia Dridi, Mokhtar Karyaoui, Todora Angelova, Guillermo Sanchez Plaza and Radhouane Chtourou

Eur. Phys. J. Plus, 132 3 (2017) 119

Published online: 08 March 2017

DOI: 10.1140/epjp/i2017-11383-2

Lamia Bouaziz

Donia Dridi

Mokhtar Karyaoui

Todora Angelova

Guillermo Sanchez Plaza

Radhouane Chtourou

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