EPJ

Optimization of reactive-ion etching (RIE) parameters for fabrication of tantalum pentoxide (Ta₂O₅) waveguide using Taguchi method

M. Firdaus A. Muttalib, Ruiqi Y. Chen, S. J. Pearce and Martin D. B. Charlton

EPJ Web Conf., 162 (2017) 01003

Published online: 22 November 2017

DOI: 10.1051/epjconf/201716201003

M. Firdaus A. Muttalib

Ruiqi Y. Chen

S. J. Pearce

Martin D. B. Charlton

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