EPJ

Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics

T. Novikova, A. De Martino, R. Ossikovski and B. Drévillon

Eur. Phys. J. Appl. Phys., 31 1 (2005) 63-69

Published online: 27 April 2005

DOI: 10.1051/epjap:2005034

T. Novikova

A. De Martino

R. Ossikovski

B. Drévillon

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