EPJ

The characterization and properties of InN grown by MOCVD

S.-G. Dong, G.-H. Fan and Y.-C. Shuai

Eur. Phys. J. Appl. Phys., 44 2 (2008) 131-136

Published online: 04 October 2008

DOI: 10.1051/epjap:2008158

S.-G. Dong

G.-H. Fan

Y.-C. Shuai

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