EPJ

Ion beam sputter deposition of TiO₂ films using oxygen ions - Systematic investigation of the correlation between process parameters and film properties

Lukas Pietzonka, Thomas Lautenschläger, Daniel Spemann, Annemarie Finzel, Jürgen W. Gerlach, Frank Frost and Carsten Bundesmann

Eur. Phys. J. B, 91 10 (2018) 252

Published online: 15 October 2018

DOI: 10.1140/epjb/e2018-90293-3

Lukas Pietzonka

Thomas Lautenschläger

Daniel Spemann

Annemarie Finzel

Jürgen W. Gerlach

Frank Frost

Carsten Bundesmann

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