EPJ

On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films

Jan Schäfer, Florian Sigeneger, Rüdiger Foest, Detlef Loffhagen and Klaus-Dieter Weltmann

Eur. Phys. J. D, 72 5 (2018) 90

Published online: 25 May 2018

DOI: 10.1140/epjd/e2017-80364-6

Jan Schäfer

Florian Sigeneger

Rüdiger Foest

Detlef Loffhagen

Klaus-Dieter Weltmann

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