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Monte Carlo simulation of the implantation profile of e⁺ in nanochanneled silicon

Francesco Guatieri, Sebastiano Mariazzi and Roberto Sennen Brusa

Eur. Phys. J. D, 72 11 (2018) 198

Published online: 20 November 2018

DOI: 10.1140/epjd/e2018-90344-y

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