EPJ D Topical Issue: Low Temperature Plasmas: Processes, Diagnostics and Applications

Details

Published on 12 May 2020

Submissions are invited for a Topical Issue of EPJD on Low Temperature Plasmas: Processes, Diagnostics and Applications. The aim of this Topical issue is to present new results in the field of low temperature plasmas with a view towards new applications, and development of advanced technologies.

Simulation and theory, combined with development of plasma diagnostics and systems, all lead to improved understanding of plasmas; understanding that enables control and application, and results in the development of new methodologies and eventually to technology transfer.

Original research papers, review articles and white paper/roadmap articles are all welcomed, covering the physics and chemistry of ionized gases, plasma surface interactions, and plasmas for existing and emerging technology.

Topics to be covered include but are not limited to:

• - Plasma diagnostics and characterization
• - Modeling and diagnostics of plasmas during nanomaterial growth or etching
• - Plasmas formed at the surface of or inside liquids
• - New vacuum or atmospheric plasma sources for plasma nanotechnology
• - New plasma processes for micro and nanoscale fabrication, green nanofabrication, improvement of industrial processes, sustainable lifecycles of natural resources
• - Applications of plasma nanotechnology in the life sciences and chemistry including: diagnostics/monitoring (integration in sensors, biosensors, lab-on-chip, MEMS, etc.)
• - Fabrication of inorganic or organic nanomaterials and nanostructures using vacuum or atmospheric plasmas, ion beams or liquid plasmas, and control of their functionality and surface properties (materials include, e.g., graphene, polymers, biomaterials, nanocatalysts)
• - Applications of plasma nanotechnology in photonics and plasmonics, energy and energy harvesting devices
• - Plasmas at new spatiotemporal scales: micro and nanoplasmas, nanosecond pulsing, nanoplasmas generated by ultrafast intense radiation

The issue is open to everyone working in the field. We invite contributors to communicate their intention to submit manuscripts for this Topical Issue to the Guest Editors as soon as possible. Please provide the tentative title of the paper and a short abstract. The full manuscripts should be submitted before the deadline directly to the EPJD Editorial Office at https://articlestatus.edpsciences.org/is/epjd/.

Submissions should be clearly identified as intended for the Topical Issue "Low Temperature Plasmas: Processes, Diagnostics and Applications". Papers will be published continuously and will appear (as soon as accepted) on the journal website. The electronic version of the Topical Issue will contain all accepted papers in the order of publication. All submitted papers will be refereed according to the usual high standards of the journal. More general information about EPJD including instructions for authors is available at http://epjd.epj.org/ .

Guest Editors:

Eva Kovacevic, CNRS/Université d'Orléans, France, This email address is being protected from spambots. You need JavaScript enabled to view it.
Steven Shannon, North Carolina State University, USA, This email address is being protected from spambots. You need JavaScript enabled to view it.
Jeon G. Han, Sungkyunkwan University, Republic of Korea, This email address is being protected from spambots. You need JavaScript enabled to view it.

Open Access

EPJ is a hybrid journal offering Open Access publication via the Open Choice programme. We have a growing number of Springer Compact “Publish and Read” arrangements – see here – which enable authors to publish OA at no direct cost (all costs are paid centrally). As of April 2020 this list includes Austria, the Netherlands, Qatar, Finland, Norway, Sweden, Hungary, Poland, the UK, Switzerland and Germany.