Whole-wafer fabrication process for three-terminal double stacked tunnel junctionsG. P. Pepe, G. Peluso, R. Scaldaferri, L. Parlato, C. Granata, E. Esposito and M. RussoEur. Phys. J. B, 23 4 (2001) 421-425DOI: https://doi.org/10.1007/s100510170032