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OVPD^® technology

N. Meyer, M. Rusu, S. Wiesner, S. Hartmann, D. Keiper, M. Schwambera, M. Gersdorff, M. Kunat, M. Heuken, W. Kowalsky and M. Ch. Lux-Steiner

Eur. Phys. J. Appl. Phys., 46 1 (2009) 12506

DOI: https://doi.org/10.1051/epjap/2009028

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