Annealing effects on microstructures of HfAlO/Si with a Ti capping layerL. Wan, X. Gong, X. H. Cheng, H. Luo, Y. Huang, B. Tang and J. ShangguanEur. Phys. J. Appl. Phys., 48 2 (2009) 20302DOI: https://doi.org/10.1051/epjap/2009164