New contact material for reduction of arc duration for dc applicationL. Doublet, N. Ben Jemaa, S. Rivoirard, C. Bourda, E. Carvou, D. Sallais, D. Givord and P. RamoniEur. Phys. J. Appl. Phys., 50 1 (2010) 12901DOI: https://doi.org/10.1051/epjap/2010018