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Atomic scale study of InP etching by Cl₂-Ar ICP plasma discharge

A. Rhallabi, R. Chanson, J.-P. Landesman, C. Cardinaud and M.-C. Fernandez

Eur. Phys. J. Appl. Phys., 53 3 (2011) 33606

DOI: https://doi.org/10.1051/epjap/2010100056

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