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Magnetoresistance studies and optimization of deposition parameters of pulsed electron deposited La_0.6Pb_0.4Mn_0.8Ru_0.2O₃ thin films

B. Singh, S.S. Manoharan, S.-H. Lim and L.G. Salamanca-Riba

Eur. Phys. J. Appl. Phys., 55 2 (2011) 20301

DOI: https://doi.org/10.1051/epjap/2011100456

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