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Polycrystalline silicon thin films on glass deposited from chlorosilane at intermediate temperatures

A. G. Benvenuto, R. H. Buitrago and J. A. Schmidt

Eur. Phys. J. Appl. Phys., 58 2 (2012) 20101

DOI: https://doi.org/10.1051/epjap/2012110311

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