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The influence of pressure on the growth of InAlN/AlN/GaN heterostructure

Y. Bi, X.L. Wang, C.M. Wang, J.P. Li, H.X. Liu, H. Chen, H.L. Xiao, C. Feng and L.J. Jiang

Eur. Phys. J. Appl. Phys., 57 3 (2012) 30103

DOI: https://doi.org/10.1051/epjap/2012110416

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