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Analytical calculation of site and surface reaction probabilities of SiH_x radicals in PECVD process

Oumelkheir Babahani, Fethi Khelfaoui and Mohammed Tayeb Meftah

Eur. Phys. J. Appl. Phys., 62 1 (2013) 10301

DOI: https://doi.org/10.1051/epjap/2013120345

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