The characteristic parameters of initiating defects in HfO2/SiO2 high-reflector multilayer thin film at wavelength of 1064 nmXiao Li, Baohe Li and Jianda ShaoEur. Phys. J. Appl. Phys., 67 3 (2014) 30301DOI: https://doi.org/10.1051/epjap/2014140078