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() preferential orientation of polycrystalline AlN grown on SiO₂/Si wafers by reactive sputter magnetron technique

Juan Bürgi, Javier García Molleja, Raúl Bolmaro, Mattia Piccoli, Edoardo Bemporad, Aldo Craievich and Jorge Feugeas

Eur. Phys. J. Appl. Phys., 74 1 (2016) 10301

DOI: https://doi.org/10.1051/epjap/2016150446

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