Influence of the deposition conditions on the optoelectronic properties of R.F. magnetron sputtered a-Si:H filmsM. Daouahi, K. Zellama, P. Elkaïm, J. Dixmier and H. BouchrihaEur. Phys. J. AP, 1 3 (1998) 301-304DOI: https://doi.org/10.1051/epjap:1998150