Photoluminescence and X-ray topography measurements on oxidation-induced stacking faults in silicon wafersH. Kakui, M. Fukuzawa, Y. Shiraishi and M. YamadaEur. Phys. J. Appl. Phys., 27 1-3 (2004) 447-450DOI: https://doi.org/10.1051/epjap:2004104