Low temperature drive-in of surface-deposited copper in silicon wafersM. L. Polignano, D. Caputo, C. Carpanese, G. Salvà and L. VanzettiEur. Phys. J. Appl. Phys., 27 1-3 (2004) 435-438DOI: https://doi.org/10.1051/epjap:2004138