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The UV-induced positive and negative refractive index changes in GeO₂-SiO₂ films

L. T. Zhang, J. Wang, W. F. Xie, Y. Hou, J. Zheng, W. Zheng and Y. S. Zhang

Eur. Phys. J. Appl. Phys., 32 2 (2005) 105-108

DOI: https://doi.org/10.1051/epjap:2005076

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