High-density microwave plasma of SiH4/H2 for high rate growth of highly crystallized microcrystalline silicon filmsH. Jia, J. K. Saha, N. Ohse and H. ShiraiEur. Phys. J. Appl. Phys., 33 3 (2006) 153-159DOI: https://doi.org/10.1051/epjap:2006018