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Influence of ion bombardment on structural and electrical properties of SiO₂ thin films deposited from O₂/HMDSO inductively coupled plasmas under continuous wave and pulsed modes

A. Bousquet, A. Goullet, C. Leteinturier, N. Coulon and A. Granier

Eur. Phys. J. Appl. Phys., 42 1 (2008) 3-8

DOI: https://doi.org/10.1051/epjap:2008038

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