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A combined FEG-SEM and TEM study of silicon nanodot assembly

P. Donnadieu, F. Roussel, V. Cocheteau, B. Caussat, P. Mur and E. Scheid

Eur. Phys. J. Appl. Phys., 44 1 (2008) 11-19

DOI: https://doi.org/10.1051/epjap:2008063

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