Effective scaling behavior of magnetization and Hamming distance in Ising thin films under a surface fieldE.M. de Sousa Luz, A. F. Siqueira, U. M.S. Costa and M. L. LyraEur. Phys. J. B, 12 1 (1999) 115-118DOI: https://doi.org/10.1007/s100510050984